2.391J Nanostructure Fabrication

Class Info

Describes current techniques used in analyzing and fabricating nanometer-length-scale structures and devices. Covers fundamentals of optical, electron (scanning, transmission, and tunneling), and atomic-force microscopy; optical, electron, ion, and nanoimprint lithography, templated self-assembly, and resist technology. Surveys substrate characterization and preparation, facilities, and metrology requirements for nanolithography. Nanodevice processing methods such as liquid and plasma etching, lift-off, electroplating, and ion-implant are also presented. Some applications in nanoelectronics, nanomaterials, and nanophotonics are discussed.

This class has 6.152, 6.161, and 2.710 as prerequisites.

2.391J will not be offered this semester. It will be available in the Spring semester, and will be instructed by H. I. Smith, K. K. Berggren and G. Barbastathis.

This class counts for a total of 12 credits. This is a graduate-level class.

In the Spring 2013 Subject Evaluations, 2.391J was rated 5.8 out of 7.0. You can find more information on MIT OpenCourseWare at the Submicrometer and Nanometer Technology site.

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MIT 2.391J Nanostructure Fabrication On The Web
Submicrometer and Nanometer Technology
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