2.391J Nanostructure Fabrication
Describes current techniques used in analyzing and fabricating nanometer-length-scale structures and devices. Covers fundamentals of optical, electron (scanning, transmission, and tunneling), and atomic-force microscopy; optical, electron, ion, and nanoimprint lithography, templated self-assembly, and resist technology. Surveys substrate characterization and preparation, facilities, and metrology requirements for nanolithography. Nanodevice processing methods such as liquid and plasma etching, lift-off, electroplating, and ion-implant are also presented. Some applications in nanoelectronics, nanomaterials, and nanophotonics are discussed.
This class counts for a total of 12 credits. This is a graduate-level class.
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