2.391[J] Nanostructure Fabrication
Describes current techniques used to analyze and fabricate nanometer-length-scale structures and devices. Emphasizes imaging and patterning of nanostructures, including fundamentals of optical, electron (scanning, transmission, and tunneling), and atomic-force microscopy; optical, electron, ion, and nanoimprint lithography, templated self-assembly, and resist technology. Surveys substrate characterization and preparation, facilities, and metrology requirements for nanolithography. Addresses nanodevice processing methods, such as liquid and plasma etching, lift-off, electroplating, and ion-implant. Discusses applications in nanoelectronics, nanomaterials, and nanophotonics.
2.391[J] will not be offered this semester. It will be available in the Spring semester, and will be instructed by K. K. Berggren.
This class counts for a total of 12 credits. This is a graduate-level class.
You can find more information at the MIT + 2.391[J] NANOSTRUCTURE FABRICATION - Google Search site.
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